Yudar H.H.Korkmaz Ş.Özen S.Şenay V.Pat S.20.04.20192019-04-2020.04.20192019-04-2020160947-8396https://dx.doi.org/10.1007/s00339-016-0262-xhttps://hdl.handle.net/20.500.12403/597This study focused on the characterization and properties of transparent and conductive indium tin oxide (ITO) thin films deposited in argon atmosphere. ITO thin films were coated onto glass substrates by radio frequency (RF) magnetron sputtering technique at 75 and 100 W RF powers. Structural characteristics of producing films were investigated through X-ray diffraction analysis. UV–Vis spectrophotometer and interferometer were used to determine transmittance, absorbance and reflectance values of samples. The surface morphology of the films was characterized by atomic force microscope. The calculated band gaps were 3.8 and 4.1 eV for the films at 75 and 100 W, respectively. The effect of RF power on crystallinity of prepared films was explored using mentioned analysis methods. The high RF power caused higher poly crystallinity in the produced samples. The thickness and refractive index values for all samples increased respect to an increment of RF power and were calculated as 20, 50 nm and 1.71, 1.86 for samples at 75 and 100 W, respectively. Finally, the estimated grain sizes for all prepared films decreased with increasing of 2? degrees, and the number of crystallite per unit volume was calculated. It was found that nearly all properties including sheet resistance and resistivity depend on the RF power. © 2016, Springer-Verlag Berlin Heidelberg.eninfo:eu-repo/semantics/closedAccessAtomic force microscopyConductive filmsEnergy gapFilm preparationIndiumITO glassMagnetron sputteringOptical propertiesOxide filmsReflectionRefractive indexSubstratesTinTin oxidesX ray diffraction analysisArgon atmospheresGlass substratesIndium tin oxide layersIndium tin oxide thin filmsRadio frequency magnetron sputteringReflectance valuesrf-Magnetron sputteringStructural characteristicsThin filmsAtomic force microscopyConductive filmsEnergy gapFilm preparationIndiumITO glassMagnetron sputteringOptical propertiesOxide filmsReflectionRefractive indexSubstratesTinTin oxidesX ray diffraction analysisArgon atmospheresGlass substratesIndium tin oxide layersIndium tin oxide thin filmsRadio frequency magnetron sputteringReflectance valuesrf-Magnetron sputteringStructural characteristicsThin filmsArticle122810.1007/s00339-016-0262-x2-s2.0-84979284423Q2WOS:000380667500034Q3