Özen S.Şenay V.Pat S.Korkmaz Ş.20.04.20192019-04-2020.04.20192019-04-2020160161-0457https://dx.doi.org/10.1002/sca.21237https://hdl.handle.net/20.500.12403/658The aim of this research is to investigate the optical and morphological properties of the InGaN thin films deposited onto amorphous glass substrates in two separate experiments with two different voltages applied between the electrodes, i.e. 500 and 600 V by means of the thermionic vacuum arc technique. This technique is original for thin film deposition and it enables thin film production in a very short period of time. The optical and morphological properties of the films were investigated by using field emission scanning electron microscope, atomic force microscope, spectroscopic ellipsometer, reflectometer, spectrophotometer, and optical tensiometer. Optical properties were also supported by empirical relations. The deposition rates were calculated as 3 and 3.3 nm/sec for 500 and 600 V, respectively. The increase in the voltage also increased the refractive index, grain size, root mean square roughness and surface free energy. According to the results of the wetting experiments, InGaN samples were low-wettable, also known as hydrophobic. SCANNING 38:14-20, 2016. © 2015 Wiley Periodicals, Inc.eninfo:eu-repo/semantics/openAccessInGaN thin filmsoptical propertiessurface free energysurface propertiesthermionic vacuum arcAmorphous filmsAtomic force microscopyDepositionDeposition ratesElectrodesFree energyOptical propertiesRefractive indexScanning electron microscopySubstratesSurface propertiesThin filmsVacuum applicationsVacuum technologyWettingEmpirical relationsField emission scanning electron microscopesMorphological propertiesRoot mean square roughnessSpectroscopic ellipsometersSurface free energyThermionic vacuum arcThin-film depositionsOptical filmsglassanalytical equipmentArticleatomic force microscopeelectric potentialelectrodeenergyfilmgrainhydrophobicitymorphologyoptical tensiometeropticspriority journalreflectometerrefraction indexscanning electron microscopespectrophotometerspectroscopic ellipsometerthermionic vacuum arc techniquevacuumInGaN thin filmsoptical propertiessurface free energysurface propertiesthermionic vacuum arcAmorphous filmsAtomic force microscopyDepositionDeposition ratesElectrodesFree energyOptical propertiesRefractive indexScanning electron microscopySubstratesSurface propertiesThin filmsVacuum applicationsVacuum technologyWettingEmpirical relationsField emission scanning electron microscopesMorphological propertiesRoot mean square roughnessSpectroscopic ellipsometersSurface free energyThermionic vacuum arcThin-film depositionsOptical filmsglassanalytical equipmentArticleatomic force microscopeelectric potentialelectrodeenergyfilmgrainhydrophobicitymorphologyoptical tensiometeropticspriority journalreflectometerrefraction indexscanning electron microscopespectrophotometerspectroscopic ellipsometerthermionic vacuum arc techniquevacuumArticle381142010.1002/sca.21237263816682-s2.0-84942052792Q3WOS:000373154600002Q3