Şenay V.Pat S.Korkmaz Ş.Aydo?muş T.Elmas S.Özen S.Ekem N.Balba? M.Z.20.04.20192019-04-2020.04.20192019-04-2020140169-4332https://dx.doi.org/10.1016/j.apsusc.2013.10.044https://hdl.handle.net/20.500.12403/781In this study, ZnO thin films were deposited on glass substrates by reactive RF magnetron sputtering method at argon-oxygen gas mixing (1:1) atmosphere. Some properties of the synthesized films were investigated by interferometry, UV-vis spectrophotometer, atomic force microscopy, and tensiometer. Tauc method was adopted to estimate the optical band gaps. The band gaps of the deposited films were affected by film thickness. We concluded that the surface composition plays a substantial role in the values of the band gaps. Nanocrystalline structures were detected in all produced samples. © 2013 Elsevier B.V. All rights reserved.eninfo:eu-repo/semantics/closedAccessOptical propertiesRF sputteringSurface propertiesZnOAtomic force microscopyEnergy gapII-VI semiconductorsMagnetron sputteringMetallic filmsNanocrystalsOptical filmsOptical propertiesSubstratesSurface propertiesZinc oxideDeposited filmsGlass substratesNano-crystalline structuresReactive radio-frequency magnetron sputteringReactive rf magnetron sputteringRf-sputteringUV-Vis spectrophotometersZnO thin filmThin filmsOptical propertiesRF sputteringSurface propertiesZnOAtomic force microscopyEnergy gapII-VI semiconductorsMagnetron sputteringMetallic filmsNanocrystalsOptical filmsOptical propertiesSubstratesSurface propertiesZinc oxideDeposited filmsGlass substratesNano-crystalline structuresReactive radio-frequency magnetron sputteringReactive rf magnetron sputteringRf-sputteringUV-Vis spectrophotometersZnO thin filmThin filmsConference Object3182510.1016/j.apsusc.2013.10.0442-s2.0-84908361207Q1WOS:000344380500002Q1