Korkmaz Ş.Geçici B.Korkmaz S.D.Mohammadigharehbagh R.Pat S.Özen S.Şenay V.Yudar H.H.20.04.20192019-04-2020.04.20192019-04-2020160042-207Xhttps://dx.doi.org/10.1016/j.vacuum.2016.06.010https://hdl.handle.net/20.500.12403/595In this paper, copper oxide (CuO/Cu2O) nanocrystalline thin films were deposited by radio frequency (RF) magnetron sputtering system at 75 W and 100 W. The surface, optical, composition and structural properties of obtaining samples were characterized by using atomic force microscopy (AFM), UV–Vis spectrophotometer, field emission scanning electron microscopy (FESEM), energy dispersive X-ray spectroscopy (EDX) and X-ray diffraction (XRD). The optical band gaps of produced films were calculated as 2.05 eV and 1.83 eV for 75 W and 100 W. The layer's thicknesses were measured as 20 nm and 50 nm using a Filmetrics F20. FESEM images of the samples prove the AFM images change and also show homogeneity of thin films and variation relative to power change, thus revealed the surface of samples disturb in homogen mode. EDX results denote presence of Cu and O elements inside the deposited samples. © 2016eninfo:eu-repo/semantics/closedAccessCompositional propertiesCuO/Cu2O thin filmsEnergy band gapOptical propertiesSurface propertiesAtomic force microscopyBand structureCopper oxidesEnergy dispersive spectroscopyEnergy gapField emission microscopesMagnetron sputteringNanocrystalsOptical emission spectroscopyOptical propertiesOxide filmsScanning electron microscopyStructural propertiesSurface propertiesX ray diffractionX ray spectroscopyAFM imageCompositional propertiesEnergy dispersive X ray spectroscopyField emission scanning electron microscopyNanocrystalline thin filmsO elementsRadio frequency magnetron sputteringRF sputtering methodThin filmsCompositional propertiesCuO/Cu2O thin filmsEnergy band gapOptical propertiesSurface propertiesAtomic force microscopyBand structureCopper oxidesEnergy dispersive spectroscopyEnergy gapField emission microscopesMagnetron sputteringNanocrystalsOptical emission spectroscopyOptical propertiesOxide filmsScanning electron microscopyStructural propertiesSurface propertiesX ray diffractionX ray spectroscopyAFM imageCompositional propertiesEnergy dispersive X ray spectroscopyField emission scanning electron microscopyNanocrystalline thin filmsO elementsRadio frequency magnetron sputteringRF sputtering methodThin filmsArticle13114214610.1016/j.vacuum.2016.06.0102-s2.0-84975864682Q1WOS:000381541400023Q3