Pat S.Mohammadigharehbagh R.Özen S.Şenay V.Yudar H.H.Korkmaz Ş.20.04.20192019-04-2020.04.20192019-04-2020170042-207Xhttps://dx.doi.org/10.1016/j.vacuum.2017.04.025https://hdl.handle.net/20.500.12403/488In this study, ZnO and aluminum doped ZnO (AZO) thin films were deposited at constant RF power of 100 W for the determine of the structural, surface, optical, electrical and nanomechanical properties. X–Ray diffraction (XRD), atomic force microscopy (AFM), nanoindentation technique and UV–Vis spectrophotometer were used. ZnO (100) and ZnO (004) orientations were detected in the ZnO and AZO films. The crystallite size values for the films were calculated as to be as 35 nm and 20 nm for ZnO and AZO thin films, respectively. It was found that the roughness values decreased to 3.15 nm from 5.15 nm for AZO and ZnO films, respectively. The hardness values of the ZnO and AZO thin films are measured as 7 GPa and 11 GPa. Young's modulus values were determined as 155 GPa and 95 GPa for ZnO and AZO films, respectively. The ZnO and AZO thin films have high transparency. © 2017 Elsevier Ltdeninfo:eu-repo/semantics/closedAccessAZOHardnessOptical propertiesZnOAluminum coatingsAtomic force microscopyCrystallite sizeElastic moduliHardnessOptical filmsOptical propertiesSemiconductor dopingZinc oxideAl-dopingAluminum-doped ZnOAZO thin filmsHardness valuesHigh transparencyNanoindentation techniquesNanomechanical propertyRf-sputteringThin filmsAZOHardnessOptical propertiesZnOAluminum coatingsAtomic force microscopyCrystallite sizeElastic moduliHardnessOptical filmsOptical propertiesSemiconductor dopingZinc oxideAl-dopingAluminum-doped ZnOAZO thin filmsHardness valuesHigh transparencyNanoindentation techniquesNanomechanical propertyRf-sputteringThin filmsArticle14121021510.1016/j.vacuum.2017.04.0252-s2.0-85017543747Q1WOS:000402352000031Q2