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Influence of oxygen partial pressure on the metastable copper oxide thin films
(World Scientific Publishing Co. Pte Ltd, 2016)
Paramelaconite (Cu4O3) is a metastable copper oxide. Metastable copper oxide thin films were deposited on glass substrates by reactive RF magnetron sputtering in argon (Ar) and oxygen (O2) gas mixture atmospheres. Ar/O2 ...