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Morphology, composition, structure and optical properties of CuO/Cu2O thin films prepared by RF sputtering method

dc.contributor.authorKorkmaz Ş.
dc.contributor.authorGeçici B.
dc.contributor.authorKorkmaz S.D.
dc.contributor.authorMohammadigharehbagh R.
dc.contributor.authorPat S.
dc.contributor.authorÖzen S.
dc.contributor.authorŞenay V.
dc.contributor.authorYudar H.H.
dc.date.accessioned20.04.201910:49:12
dc.date.accessioned2019-04-20T21:43:33Z
dc.date.available20.04.201910:49:12
dc.date.available2019-04-20T21:43:33Z
dc.date.issued2016
dc.identifier.issn0042-207X
dc.identifier.urihttps://dx.doi.org/10.1016/j.vacuum.2016.06.010
dc.identifier.urihttps://hdl.handle.net/20.500.12403/595
dc.description.abstractIn this paper, copper oxide (CuO/Cu2O) nanocrystalline thin films were deposited by radio frequency (RF) magnetron sputtering system at 75 W and 100 W. The surface, optical, composition and structural properties of obtaining samples were characterized by using atomic force microscopy (AFM), UV–Vis spectrophotometer, field emission scanning electron microscopy (FESEM), energy dispersive X-ray spectroscopy (EDX) and X-ray diffraction (XRD). The optical band gaps of produced films were calculated as 2.05 eV and 1.83 eV for 75 W and 100 W. The layer's thicknesses were measured as 20 nm and 50 nm using a Filmetrics F20. FESEM images of the samples prove the AFM images change and also show homogeneity of thin films and variation relative to power change, thus revealed the surface of samples disturb in homogen mode. EDX results denote presence of Cu and O elements inside the deposited samples. © 2016en_US
dc.language.isoengen_US
dc.publisherElsevier Ltd
dc.relation.isversionof10.1016/j.vacuum.2016.06.010
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectCompositional properties
dc.subjectCuO/Cu2O thin films
dc.subjectEnergy band gap
dc.subjectOptical properties
dc.subjectSurface properties
dc.subjectAtomic force microscopy
dc.subjectBand structure
dc.subjectCopper oxides
dc.subjectEnergy dispersive spectroscopy
dc.subjectEnergy gap
dc.subjectField emission microscopes
dc.subjectMagnetron sputtering
dc.subjectNanocrystals
dc.subjectOptical emission spectroscopy
dc.subjectOptical properties
dc.subjectOxide films
dc.subjectScanning electron microscopy
dc.subjectStructural properties
dc.subjectSurface properties
dc.subjectX ray diffraction
dc.subjectX ray spectroscopy
dc.subjectAFM image
dc.subjectCompositional properties
dc.subjectEnergy dispersive X ray spectroscopy
dc.subjectField emission scanning electron microscopy
dc.subjectNanocrystalline thin films
dc.subjectO elements
dc.subjectRadio frequency magnetron sputtering
dc.subjectRF sputtering method
dc.subjectThin films
dc.subjectCompositional properties
dc.subjectCuO/Cu2O thin films
dc.subjectEnergy band gap
dc.subjectOptical properties
dc.subjectSurface properties
dc.subjectAtomic force microscopy
dc.subjectBand structure
dc.subjectCopper oxides
dc.subjectEnergy dispersive spectroscopy
dc.subjectEnergy gap
dc.subjectField emission microscopes
dc.subjectMagnetron sputtering
dc.subjectNanocrystals
dc.subjectOptical emission spectroscopy
dc.subjectOptical properties
dc.subjectOxide films
dc.subjectScanning electron microscopy
dc.subjectStructural properties
dc.subjectSurface properties
dc.subjectX ray diffraction
dc.subjectX ray spectroscopy
dc.subjectAFM image
dc.subjectCompositional properties
dc.subjectEnergy dispersive X ray spectroscopy
dc.subjectField emission scanning electron microscopy
dc.subjectNanocrystalline thin films
dc.subjectO elements
dc.subjectRadio frequency magnetron sputtering
dc.subjectRF sputtering method
dc.subjectThin films
dc.titleMorphology, composition, structure and optical properties of CuO/Cu2O thin films prepared by RF sputtering methoden_US
dc.typearticleen_US
dc.relation.journalVacuumen_US
dc.contributor.departmentBayburt Universityen_US
dc.contributor.authorID7003415405
dc.contributor.authorID56659484600
dc.contributor.authorID35188974500
dc.contributor.authorID57189905524
dc.contributor.authorID9274843500
dc.contributor.authorID55897767500
dc.contributor.authorID55897416100
dc.contributor.authorID57189904041
dc.identifier.volume131
dc.identifier.startpage142
dc.identifier.endpage146
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US


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