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dc.contributor.authorÖzen S.
dc.contributor.authorŞenay V.
dc.contributor.authorPat S.
dc.contributor.authorKorkmaz Ş.
dc.date.accessioned20.04.201910:49:12
dc.date.accessioned2019-04-20T21:43:40Z
dc.date.available20.04.201910:49:12
dc.date.available2019-04-20T21:43:40Z
dc.date.issued2016
dc.identifier.issn0022-3727
dc.identifier.urihttps://dx.doi.org/10.1088/0022-3727/49/10/105303
dc.identifier.urihttps://hdl.handle.net/20.500.12403/640
dc.description.abstractLTO thin film was deposited for the first time on a glass microscope slide (MS) by RF magnetron sputtering technology. This method has been suitable for preparation of high-quality thin films. The surface properties of the produced film were determined by atomic force microscope (AFM). The surface of the produced film appeared smooth and homogeneous. LTO coated on MS had compact structure and low roughness. A UV-vis spectrophotometer was used to determine intensity of light passing through the samples. Thus, according to the results obtained the produced film was highly transparent. The refractive index of the LTO thin film was presented in a low MSE value by spectroscopic ellipsometry (SE) and it was about 1.5. The optical band gap (Eg) was determined by the Tauc method. The produced LTO thin film exhibited a wide band gap semiconductor property with a band gap energy of about 2.95 eV. Finally, the surface free energy of the LTO thin film was calculated from the contact angle measurements using the Lewis acid-base, OWRK/Fowkes, Wu and Zisman methods. © 2016 IOP Publishing Ltd.en_US
dc.language.isoengen_US
dc.publisherInstitute of Physics Publishing
dc.relation.isversionof10.1088/0022-3727/49/10/105303
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectextinction coefficient
dc.subjectlithium titanate
dc.subjectrefractive index
dc.subjectRF magnetron sputtering
dc.subjectsurface free energy
dc.subjecttransparent oxide film
dc.subjectAnodes
dc.subjectAtomic force microscopy
dc.subjectElectric batteries
dc.subjectEnergy gap
dc.subjectFilm preparation
dc.subjectFree energy
dc.subjectLithium-ion batteries
dc.subjectMagnetron sputtering
dc.subjectOxide films
dc.subjectRefractive index
dc.subjectSpectroscopic ellipsometry
dc.subjectWide band gap semiconductors
dc.subjectExtinction coefficients
dc.subjectLithium titanate
dc.subjectrf-Magnetron sputtering
dc.subjectSurface free energy
dc.subjectTransparent oxide films
dc.subjectThin films
dc.subjectextinction coefficient
dc.subjectlithium titanate
dc.subjectrefractive index
dc.subjectRF magnetron sputtering
dc.subjectsurface free energy
dc.subjecttransparent oxide film
dc.subjectAnodes
dc.subjectAtomic force microscopy
dc.subjectElectric batteries
dc.subjectEnergy gap
dc.subjectFilm preparation
dc.subjectFree energy
dc.subjectLithium-ion batteries
dc.subjectMagnetron sputtering
dc.subjectOxide films
dc.subjectRefractive index
dc.subjectSpectroscopic ellipsometry
dc.subjectWide band gap semiconductors
dc.subjectExtinction coefficients
dc.subjectLithium titanate
dc.subjectrf-Magnetron sputtering
dc.subjectSurface free energy
dc.subjectTransparent oxide films
dc.subjectThin films
dc.titleOptical, morphological properties and surface energy of the transparent Li4Ti5O12 (LTO) thin film as anode material for secondary type batteriesen_US
dc.typearticleen_US
dc.relation.journalJournal of Physics D: Applied Physicsen_US
dc.contributor.departmentBayburt Universityen_US
dc.contributor.authorID55897767500
dc.contributor.authorID55897416100
dc.contributor.authorID9274843500
dc.contributor.authorID7003415405
dc.identifier.volume49
dc.identifier.issue10
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US


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