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dc.contributor.authorŞenay V.
dc.contributor.authorPat S.
dc.contributor.authorKorkmaz Ş.
dc.contributor.authorAydo?muş T.
dc.contributor.authorElmas S.
dc.contributor.authorÖzen S.
dc.contributor.authorEkem N.
dc.contributor.authorBalba? M.Z.
dc.date.accessioned20.04.201910:49:12
dc.date.accessioned2019-04-20T21:44:09Z
dc.date.available20.04.201910:49:12
dc.date.available2019-04-20T21:44:09Z
dc.date.issued2014
dc.identifier.issn0169-4332
dc.identifier.urihttps://dx.doi.org/10.1016/j.apsusc.2013.10.044
dc.identifier.urihttps://hdl.handle.net/20.500.12403/781
dc.description.abstractIn this study, ZnO thin films were deposited on glass substrates by reactive RF magnetron sputtering method at argon-oxygen gas mixing (1:1) atmosphere. Some properties of the synthesized films were investigated by interferometry, UV-vis spectrophotometer, atomic force microscopy, and tensiometer. Tauc method was adopted to estimate the optical band gaps. The band gaps of the deposited films were affected by film thickness. We concluded that the surface composition plays a substantial role in the values of the band gaps. Nanocrystalline structures were detected in all produced samples. © 2013 Elsevier B.V. All rights reserved.en_US
dc.language.isoengen_US
dc.publisherElsevier B.V.
dc.relation.isversionof10.1016/j.apsusc.2013.10.044
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectOptical properties
dc.subjectRF sputtering
dc.subjectSurface properties
dc.subjectZnO
dc.subjectAtomic force microscopy
dc.subjectEnergy gap
dc.subjectII-VI semiconductors
dc.subjectMagnetron sputtering
dc.subjectMetallic films
dc.subjectNanocrystals
dc.subjectOptical films
dc.subjectOptical properties
dc.subjectSubstrates
dc.subjectSurface properties
dc.subjectZinc oxide
dc.subjectDeposited films
dc.subjectGlass substrates
dc.subjectNano-crystalline structures
dc.subjectReactive radio-frequency magnetron sputtering
dc.subjectReactive rf magnetron sputtering
dc.subjectRf-sputtering
dc.subjectUV-Vis spectrophotometers
dc.subjectZnO thin film
dc.subjectThin films
dc.subjectOptical properties
dc.subjectRF sputtering
dc.subjectSurface properties
dc.subjectZnO
dc.subjectAtomic force microscopy
dc.subjectEnergy gap
dc.subjectII-VI semiconductors
dc.subjectMagnetron sputtering
dc.subjectMetallic films
dc.subjectNanocrystals
dc.subjectOptical films
dc.subjectOptical properties
dc.subjectSubstrates
dc.subjectSurface properties
dc.subjectZinc oxide
dc.subjectDeposited films
dc.subjectGlass substrates
dc.subjectNano-crystalline structures
dc.subjectReactive radio-frequency magnetron sputtering
dc.subjectReactive rf magnetron sputtering
dc.subjectRf-sputtering
dc.subjectUV-Vis spectrophotometers
dc.subjectZnO thin film
dc.subjectThin films
dc.titleZnO thin film synthesis by reactive radio frequency magnetron sputteringen_US
dc.typeconferenceObjecten_US
dc.relation.journalApplied Surface Scienceen_US
dc.contributor.departmentBayburt Universityen_US
dc.contributor.authorID55897416100
dc.contributor.authorID9274843500
dc.contributor.authorID7003415405
dc.contributor.authorID56399348800
dc.contributor.authorID54909207600
dc.contributor.authorID55897767500
dc.contributor.authorID9274843600
dc.contributor.authorID56399349300
dc.identifier.volume318
dc.identifier.startpage2
dc.identifier.endpage5
dc.relation.publicationcategoryKonferans Öğesi - Uluslararası - Kurum Öğretim Elemanıen_US


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