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dc.contributor.authorÖzen S.
dc.contributor.authorŞenay V.
dc.contributor.authorPat S.
dc.contributor.authorKorkmaz Ş.
dc.date.accessioned20.04.201910:49:12
dc.date.accessioned2019-04-20T21:43:46Z
dc.date.available20.04.201910:49:12
dc.date.available2019-04-20T21:43:46Z
dc.date.issued2015
dc.identifier.issn0925-8388
dc.identifier.urihttps://dx.doi.org/10.1016/j.jallcom.2015.08.225
dc.identifier.urihttps://hdl.handle.net/20.500.12403/673
dc.description.abstractThe purpose of this paper is to analyze surface properties of AlGaN thin film produced using thermionic vacuum arc technique. Thermionic vacuum arc is an alternative deposition technique for GaN thin films that produces in a very short production time for GaN-based solid-state applications. XRD results showed that AlGaN thin film with cubic crystal structure on a amorphous glass was grown. Conductivity type of AlGaN thin film is determined as p-type by hot-probe method which is a very simple method. The surface morphology was analyzed and discussed using field emission scanning electron microscopy (FESEM) and atomic force microscopy. The contact angles in four different testing liquid and surface free energy of the AlGaN thin film were investigated by optical tensiometer. © 2015 Elsevier B.V.en_US
dc.language.isoengen_US
dc.publisherElsevier Ltd
dc.relation.isversionof10.1016/j.jallcom.2015.08.225
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectAlGaN thin film
dc.subjectFESEM
dc.subjectSurface free energy
dc.subjectThermionic vacuum arc
dc.subjectXRD
dc.subjectAmorphous films
dc.subjectAtomic force microscopy
dc.subjectCrystal structure
dc.subjectDeposition
dc.subjectField emission microscopes
dc.subjectFree energy
dc.subjectGallium nitride
dc.subjectScanning electron microscopy
dc.subjectVacuum applications
dc.subjectVacuum technology
dc.subjectAlGaN
dc.subjectFESEM
dc.subjectSurface free energy
dc.subjectThermionic vacuum arc
dc.subjectXRD
dc.subjectThin films
dc.subjectAlGaN thin film
dc.subjectFESEM
dc.subjectSurface free energy
dc.subjectThermionic vacuum arc
dc.subjectXRD
dc.subjectAmorphous films
dc.subjectAtomic force microscopy
dc.subjectCrystal structure
dc.subjectDeposition
dc.subjectField emission microscopes
dc.subjectFree energy
dc.subjectGallium nitride
dc.subjectScanning electron microscopy
dc.subjectVacuum applications
dc.subjectVacuum technology
dc.subjectAlGaN
dc.subjectFESEM
dc.subjectSurface free energy
dc.subjectThermionic vacuum arc
dc.subjectXRD
dc.subjectThin films
dc.titleInvestigation on the morphology and surface free energy of the AlGaN thin filmen_US
dc.typearticleen_US
dc.relation.journalJournal of Alloys and Compoundsen_US
dc.contributor.departmentBayburt Universityen_US
dc.contributor.authorID55897767500
dc.contributor.authorID55897416100
dc.contributor.authorID9274843500
dc.contributor.authorID7003415405
dc.identifier.volume653
dc.identifier.startpage162
dc.identifier.endpage167
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US


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