Optical and Surface Properties of Nanostructured ZnO Semiconductor Thin Films Synthesized by RF Magnetron Sputtering

dc.contributor.authorŞenay, Volkan
dc.date.accessioned2024-10-04T19:06:34Z
dc.date.available2024-10-04T19:06:34Z
dc.date.issued2019
dc.departmentBayburt Üniversitesien_US
dc.description.abstractIn this research, ZnO thin films were deposited on glass microscope slides in three separate experiments with RF inputpowers of 50 W, 100 W and 125 W by means of RF magnetron sputtering technique. Each deposition process wasconducted for 30 minutes. Spectroscopic reflectometer, UV-VIS spectrophotometer and atomic force microscope(AFM) were used to examine the effect of sputtering power on the optical and surface properties of the produced thinfilms. The level of reflectivity and transparency, refractive index and band gap energy values as well as surfacehomogeneity and roughness were observed to rely on the RF input power. The optical band gap energy values wereabout 3.83-3.87 eV. The produced highly transparent ZnO thin films can be used in various optoelectronic devices andfuture transparent conductive electrode implementations.en_US
dc.identifier.doi10.17714/gumusfenbil.538545
dc.identifier.endpage767en_US
dc.identifier.issn2146-538X
dc.identifier.issue4en_US
dc.identifier.startpage759en_US
dc.identifier.trdizinid394654en_US
dc.identifier.urihttps://doi.org/10.17714/gumusfenbil.538545
dc.identifier.urihttps://search.trdizin.gov.tr/tr/yayin/detay/394654
dc.identifier.urihttp://hdl.handle.net/20.500.12403/4586
dc.identifier.volume9en_US
dc.indekslendigikaynakTR-Dizinen_US
dc.language.isoenen_US
dc.relation.ispartofGümüşhane Üniversitesi Fen Bilimleri Dergisien_US
dc.relation.publicationcategoryMakale - Ulusal Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/openAccessen_US
dc.titleOptical and Surface Properties of Nanostructured ZnO Semiconductor Thin Films Synthesized by RF Magnetron Sputteringen_US
dc.typeArticleen_US

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