Influence of RF power on optical and surface properties of the ZnO thin films deposited by magnetron sputtering

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dc.authorid9274843500
dc.authorid55897416100
dc.authorid55897767500
dc.authorid7003415405
dc.authorid56659484600
dc.contributor.authorPat S.
dc.contributor.authorŞenay V.
dc.contributor.authorÖzen S.
dc.contributor.authorKorkmaz S.
dc.contributor.authorGeçici B.
dc.date.accessioned20.04.201910:49:12
dc.date.accessioned2019-04-20T21:44:03Z
dc.date.available20.04.201910:49:12
dc.date.available2019-04-20T21:44:03Z
dc.date.issued2015
dc.departmentBayburt Üniversitesien_US
dc.description.abstractThe influences of the effects of sputtering power on the optical and structural properties of ZnO thin films were investigated. The ZnO layers were deposited on glass slides by RF magnetron sputtering. RF sputtering powers were adjust to 150 W and 250 W. Optical analysis and tools and methods were used for the comparison of the optical and surface properties. The results show that sputtering powers have affected the optical and surface properties. The band gap variations of ZnO thin films are observed. The samples are transparent. The roughness values of sample grown at 250 W are increased threefold in comparison with sample grown at 150 W while RF power is increased. Furthermore, surface contact angle was decreased to one-half of its values obtained at low RF power. This value is close to theoretical limit of contact angle. Obtained results show that surface properties of the layers can changed by RF power, but optical properties are slightly different. Copyright © 2015 American Scientific Publishers All rights reserved.en_US
dc.identifier.doi10.1166/jno.2015.1724
dc.identifier.endpage186
dc.identifier.issn1555-130X
dc.identifier.issue2
dc.identifier.scopus2-s2.0-84931065512en_US
dc.identifier.scopusqualityN/Aen_US
dc.identifier.startpage183
dc.identifier.urihttps://dx.doi.org/10.1166/jno.2015.1724
dc.identifier.urihttps://hdl.handle.net/20.500.12403/754
dc.identifier.volume10
dc.identifier.wosWOS:000357170600004en_US
dc.identifier.wosqualityQ3en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherAmerican Scientific Publishers
dc.relation.ispartofJournal of Nanoelectronics and Optoelectronicsen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectBand gap
dc.subjectRF power
dc.subjectSputtering
dc.subjectSurface properties
dc.subjectZnO thin films
dc.subjectContact angle
dc.subjectEnergy gap
dc.subjectMagnetron sputtering
dc.subjectMetallic films
dc.subjectOptical films
dc.subjectSputtering
dc.subjectSurface properties
dc.subjectThin films
dc.subjectZinc oxide
dc.subjectBand gap variation
dc.subjectrf-Magnetron sputtering
dc.subjectRf-power
dc.subjectSputtering power
dc.subjectSurface contact angle
dc.subjectTheoretical limits
dc.subjectTools and methods
dc.subjectZnO thin film
dc.subjectOptical properties
dc.subjectBand gap
dc.subjectRF power
dc.subjectSputtering
dc.subjectSurface properties
dc.subjectZnO thin films
dc.subjectContact angle
dc.subjectEnergy gap
dc.subjectMagnetron sputtering
dc.subjectMetallic films
dc.subjectOptical films
dc.subjectSputtering
dc.subjectSurface properties
dc.subjectThin films
dc.subjectZinc oxide
dc.subjectBand gap variation
dc.subjectrf-Magnetron sputtering
dc.subjectRf-power
dc.subjectSputtering power
dc.subjectSurface contact angle
dc.subjectTheoretical limits
dc.subjectTools and methods
dc.subjectZnO thin film
dc.subjectOptical properties
dc.titleInfluence of RF power on optical and surface properties of the ZnO thin films deposited by magnetron sputteringen_US
dc.typeArticleen_US

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