Investigation of structural, morphological and optical properties of Nickel-doped Zinc oxide thin films fabricated by co-sputtering

Basit Öğe Kaydı
dc.authorid55523238500
dc.authorid57205334785
dc.authorid57201333718
dc.authorid7004622888
dc.contributor.authorBayram O.
dc.contributor.authorSener E.
dc.contributor.authorİgman E.
dc.contributor.authorSimsek O.
dc.date.accessioned20.04.201910:49:12
dc.date.accessioned2019-04-20T21:42:58Z
dc.date.available20.04.201910:49:12
dc.date.available2019-04-20T21:42:58Z
dc.date.issued2019
dc.departmentBayburt Üniversitesien_US
dc.description.abstractIn this study, it was aimed to grow Nickel doped (0.0 at.%, 0.16 at.%, 0.20 at. % and 0.24 at. %) Zinc Oxide (NZO) thin films on quartz substrates using Magnetron Sputtering technique. NZO thin films were obtained at a temperature of 450 °C, a pressure of 480 m Torr and a deposition time of 30 min. Co-sputtering process for both Ni and ZnO target was performed using two separate power sources. The DC power of the Ni target material was 20, 30 and 40 W, respectively while the radio frequency (RF) power of the Zinc oxide (ZnO) target material was set to 150 W. Using XRD analysis, thin films were found to have polycrystalline morphology, and the average crystallite size changed significantly depending on the increased Ni doping level. The optical Transmittance of the thin films was greater than 90% in the visible region (550 nm), and this value tends to decrease slightly by Ni doping. The optical band gap (E g ) firstly decreased and then slightly increased with the Nickel doping ratio and these values were found to be 3.23 eV, 3.11 eV and 3.15 eV, respectively, with increase of Ni doping. © 2019, Springer Science+Business Media, LLC, part of Springer Nature.en_US
dc.identifier.doi10.1007/s10854-018-00620-2
dc.identifier.endpage3458
dc.identifier.issn0957-4522
dc.identifier.issue4
dc.identifier.scopus2-s2.0-85059566317en_US
dc.identifier.scopusqualityQ2en_US
dc.identifier.startpage3452
dc.identifier.urihttps://dx.doi.org/10.1007/s10854-018-00620-2
dc.identifier.urihttps://hdl.handle.net/20.500.12403/314
dc.identifier.volume30
dc.identifier.wosWOS:000460643200030en_US
dc.identifier.wosqualityQ2en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherSpringer New York LLC
dc.relation.ispartofJournal of Materials Science: Materials in Electronicsen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectCobalt compounds
dc.subjectCrystallite size
dc.subjectEnergy gap
dc.subjectII-VI semiconductors
dc.subjectNickel oxide
dc.subjectOptical properties
dc.subjectOxide films
dc.subjectSemiconductor doping
dc.subjectSputtering
dc.subjectZinc oxide
dc.subjectDeposition time
dc.subjectDoped zinc oxide thin films
dc.subjectPolycrystalline morphology
dc.subjectQuartz substrate
dc.subjectRadio frequency power
dc.subjectTarget materials
dc.subjectVisible region
dc.subjectZinc oxide (ZnO)
dc.subjectThin films
dc.subjectCobalt compounds
dc.subjectCrystallite size
dc.subjectEnergy gap
dc.subjectII-VI semiconductors
dc.subjectNickel oxide
dc.subjectOptical properties
dc.subjectOxide films
dc.subjectSemiconductor doping
dc.subjectSputtering
dc.subjectZinc oxide
dc.subjectDeposition time
dc.subjectDoped zinc oxide thin films
dc.subjectPolycrystalline morphology
dc.subjectQuartz substrate
dc.subjectRadio frequency power
dc.subjectTarget materials
dc.subjectVisible region
dc.subjectZinc oxide (ZnO)
dc.subjectThin films
dc.titleInvestigation of structural, morphological and optical properties of Nickel-doped Zinc oxide thin films fabricated by co-sputteringen_US
dc.typeArticleen_US

Dosyalar

Koleksiyon

Scopus İndeksli Yayınlar Koleksiyonu
WoS İndeksli Yayınlar Koleksiyonu