Investigation on the morphology and surface free energy of the AlGaN thin film
Küçük Resim Yok
Tarih
2015
Yazarlar
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
Elsevier Ltd
Erişim Hakkı
info:eu-repo/semantics/closedAccess
Özet
The purpose of this paper is to analyze surface properties of AlGaN thin film produced using thermionic vacuum arc technique. Thermionic vacuum arc is an alternative deposition technique for GaN thin films that produces in a very short production time for GaN-based solid-state applications. XRD results showed that AlGaN thin film with cubic crystal structure on a amorphous glass was grown. Conductivity type of AlGaN thin film is determined as p-type by hot-probe method which is a very simple method. The surface morphology was analyzed and discussed using field emission scanning electron microscopy (FESEM) and atomic force microscopy. The contact angles in four different testing liquid and surface free energy of the AlGaN thin film were investigated by optical tensiometer. © 2015 Elsevier B.V.
Açıklama
Anahtar Kelimeler
AlGaN thin film, FESEM, Surface free energy, Thermionic vacuum arc, XRD, Amorphous films, Atomic force microscopy, Crystal structure, Deposition, Field emission microscopes, Free energy, Gallium nitride, Scanning electron microscopy, Vacuum applications, Vacuum technology, AlGaN, FESEM, Surface free energy, Thermionic vacuum arc, XRD, Thin films, AlGaN thin film, FESEM, Surface free energy, Thermionic vacuum arc, XRD, Amorphous films, Atomic force microscopy, Crystal structure, Deposition, Field emission microscopes, Free energy, Gallium nitride, Scanning electron microscopy, Vacuum applications, Vacuum technology, AlGaN, FESEM, Surface free energy, Thermionic vacuum arc, XRD, Thin films
Kaynak
Journal of Alloys and Compounds
WoS Q Değeri
Q1
Scopus Q Değeri
Q1
Cilt
653
