Investigation on the morphology and surface free energy of the AlGaN thin film

Küçük Resim Yok

Tarih

2015

Dergi Başlığı

Dergi ISSN

Cilt Başlığı

Yayıncı

Elsevier Ltd

Erişim Hakkı

info:eu-repo/semantics/closedAccess

Özet

The purpose of this paper is to analyze surface properties of AlGaN thin film produced using thermionic vacuum arc technique. Thermionic vacuum arc is an alternative deposition technique for GaN thin films that produces in a very short production time for GaN-based solid-state applications. XRD results showed that AlGaN thin film with cubic crystal structure on a amorphous glass was grown. Conductivity type of AlGaN thin film is determined as p-type by hot-probe method which is a very simple method. The surface morphology was analyzed and discussed using field emission scanning electron microscopy (FESEM) and atomic force microscopy. The contact angles in four different testing liquid and surface free energy of the AlGaN thin film were investigated by optical tensiometer. © 2015 Elsevier B.V.

Açıklama

Anahtar Kelimeler

AlGaN thin film, FESEM, Surface free energy, Thermionic vacuum arc, XRD, Amorphous films, Atomic force microscopy, Crystal structure, Deposition, Field emission microscopes, Free energy, Gallium nitride, Scanning electron microscopy, Vacuum applications, Vacuum technology, AlGaN, FESEM, Surface free energy, Thermionic vacuum arc, XRD, Thin films, AlGaN thin film, FESEM, Surface free energy, Thermionic vacuum arc, XRD, Amorphous films, Atomic force microscopy, Crystal structure, Deposition, Field emission microscopes, Free energy, Gallium nitride, Scanning electron microscopy, Vacuum applications, Vacuum technology, AlGaN, FESEM, Surface free energy, Thermionic vacuum arc, XRD, Thin films

Kaynak

Journal of Alloys and Compounds

WoS Q Değeri

Q1

Scopus Q Değeri

Q1

Cilt

653

Sayı

Künye