The Al doping effect on the surface, optical, electrical and nanomechanical properties of the ZnO and AZO thin films prepared by RF sputtering technique

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dc.authorid9274843500
dc.authorid57189905524
dc.authorid55897767500
dc.authorid55897416100
dc.authorid57189904041
dc.authorid7003415405
dc.contributor.authorPat S.
dc.contributor.authorMohammadigharehbagh R.
dc.contributor.authorÖzen S.
dc.contributor.authorŞenay V.
dc.contributor.authorYudar H.H.
dc.contributor.authorKorkmaz Ş.
dc.date.accessioned20.04.201910:49:12
dc.date.accessioned2019-04-20T21:43:17Z
dc.date.available20.04.201910:49:12
dc.date.available2019-04-20T21:43:17Z
dc.date.issued2017
dc.departmentBayburt Üniversitesien_US
dc.description.abstractIn this study, ZnO and aluminum doped ZnO (AZO) thin films were deposited at constant RF power of 100 W for the determine of the structural, surface, optical, electrical and nanomechanical properties. X–Ray diffraction (XRD), atomic force microscopy (AFM), nanoindentation technique and UV–Vis spectrophotometer were used. ZnO (100) and ZnO (004) orientations were detected in the ZnO and AZO films. The crystallite size values for the films were calculated as to be as 35 nm and 20 nm for ZnO and AZO thin films, respectively. It was found that the roughness values decreased to 3.15 nm from 5.15 nm for AZO and ZnO films, respectively. The hardness values of the ZnO and AZO thin films are measured as 7 GPa and 11 GPa. Young's modulus values were determined as 155 GPa and 95 GPa for ZnO and AZO films, respectively. The ZnO and AZO thin films have high transparency. © 2017 Elsevier Ltden_US
dc.identifier.doi10.1016/j.vacuum.2017.04.025
dc.identifier.endpage215
dc.identifier.issn0042-207X
dc.identifier.scopus2-s2.0-85017543747en_US
dc.identifier.scopusqualityQ1en_US
dc.identifier.startpage210
dc.identifier.urihttps://dx.doi.org/10.1016/j.vacuum.2017.04.025
dc.identifier.urihttps://hdl.handle.net/20.500.12403/488
dc.identifier.volume141
dc.identifier.wosWOS:000402352000031en_US
dc.identifier.wosqualityQ2en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherElsevier Ltd
dc.relation.ispartofVacuumen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectAZO
dc.subjectHardness
dc.subjectOptical properties
dc.subjectZnO
dc.subjectAluminum coatings
dc.subjectAtomic force microscopy
dc.subjectCrystallite size
dc.subjectElastic moduli
dc.subjectHardness
dc.subjectOptical films
dc.subjectOptical properties
dc.subjectSemiconductor doping
dc.subjectZinc oxide
dc.subjectAl-doping
dc.subjectAluminum-doped ZnO
dc.subjectAZO thin films
dc.subjectHardness values
dc.subjectHigh transparency
dc.subjectNanoindentation techniques
dc.subjectNanomechanical property
dc.subjectRf-sputtering
dc.subjectThin films
dc.subjectAZO
dc.subjectHardness
dc.subjectOptical properties
dc.subjectZnO
dc.subjectAluminum coatings
dc.subjectAtomic force microscopy
dc.subjectCrystallite size
dc.subjectElastic moduli
dc.subjectHardness
dc.subjectOptical films
dc.subjectOptical properties
dc.subjectSemiconductor doping
dc.subjectZinc oxide
dc.subjectAl-doping
dc.subjectAluminum-doped ZnO
dc.subjectAZO thin films
dc.subjectHardness values
dc.subjectHigh transparency
dc.subjectNanoindentation techniques
dc.subjectNanomechanical property
dc.subjectRf-sputtering
dc.subjectThin films
dc.titleThe Al doping effect on the surface, optical, electrical and nanomechanical properties of the ZnO and AZO thin films prepared by RF sputtering techniqueen_US
dc.typeArticleen_US

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