Surface and optical properties of indium tin oxide layer deposition by RF magnetron sputtering in argon atmosphere
Küçük Resim Yok
Tarih
2016
Yazarlar
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
Springer Verlag
Erişim Hakkı
info:eu-repo/semantics/closedAccess
Özet
This study focused on the characterization and properties of transparent and conductive indium tin oxide (ITO) thin films deposited in argon atmosphere. ITO thin films were coated onto glass substrates by radio frequency (RF) magnetron sputtering technique at 75 and 100 W RF powers. Structural characteristics of producing films were investigated through X-ray diffraction analysis. UV–Vis spectrophotometer and interferometer were used to determine transmittance, absorbance and reflectance values of samples. The surface morphology of the films was characterized by atomic force microscope. The calculated band gaps were 3.8 and 4.1 eV for the films at 75 and 100 W, respectively. The effect of RF power on crystallinity of prepared films was explored using mentioned analysis methods. The high RF power caused higher poly crystallinity in the produced samples. The thickness and refractive index values for all samples increased respect to an increment of RF power and were calculated as 20, 50 nm and 1.71, 1.86 for samples at 75 and 100 W, respectively. Finally, the estimated grain sizes for all prepared films decreased with increasing of 2? degrees, and the number of crystallite per unit volume was calculated. It was found that nearly all properties including sheet resistance and resistivity depend on the RF power. © 2016, Springer-Verlag Berlin Heidelberg.
Açıklama
Anahtar Kelimeler
Atomic force microscopy, Conductive films, Energy gap, Film preparation, Indium, ITO glass, Magnetron sputtering, Optical properties, Oxide films, Reflection, Refractive index, Substrates, Tin, Tin oxides, X ray diffraction analysis, Argon atmospheres, Glass substrates, Indium tin oxide layers, Indium tin oxide thin films, Radio frequency magnetron sputtering, Reflectance values, rf-Magnetron sputtering, Structural characteristics, Thin films, Atomic force microscopy, Conductive films, Energy gap, Film preparation, Indium, ITO glass, Magnetron sputtering, Optical properties, Oxide films, Reflection, Refractive index, Substrates, Tin, Tin oxides, X ray diffraction analysis, Argon atmospheres, Glass substrates, Indium tin oxide layers, Indium tin oxide thin films, Radio frequency magnetron sputtering, Reflectance values, rf-Magnetron sputtering, Structural characteristics, Thin films
Kaynak
Applied Physics A: Materials Science and Processing
WoS Q Değeri
Q3
Scopus Q Değeri
Q2
Cilt
122
Sayı
8
