The influence of voltage applied between the electrodes on optical and morphological properties of the InGaN thin films grown by thermionic vacuum arc
Küçük Resim Yok
Tarih
2016
Yazarlar
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
John Wiley and Sons Inc.
Erişim Hakkı
info:eu-repo/semantics/openAccess
Özet
The aim of this research is to investigate the optical and morphological properties of the InGaN thin films deposited onto amorphous glass substrates in two separate experiments with two different voltages applied between the electrodes, i.e. 500 and 600 V by means of the thermionic vacuum arc technique. This technique is original for thin film deposition and it enables thin film production in a very short period of time. The optical and morphological properties of the films were investigated by using field emission scanning electron microscope, atomic force microscope, spectroscopic ellipsometer, reflectometer, spectrophotometer, and optical tensiometer. Optical properties were also supported by empirical relations. The deposition rates were calculated as 3 and 3.3 nm/sec for 500 and 600 V, respectively. The increase in the voltage also increased the refractive index, grain size, root mean square roughness and surface free energy. According to the results of the wetting experiments, InGaN samples were low-wettable, also known as hydrophobic. SCANNING 38:14-20, 2016. © 2015 Wiley Periodicals, Inc.
Açıklama
Anahtar Kelimeler
InGaN thin films, optical properties, surface free energy, surface properties, thermionic vacuum arc, Amorphous films, Atomic force microscopy, Deposition, Deposition rates, Electrodes, Free energy, Optical properties, Refractive index, Scanning electron microscopy, Substrates, Surface properties, Thin films, Vacuum applications, Vacuum technology, Wetting, Empirical relations, Field emission scanning electron microscopes, Morphological properties, Root mean square roughness, Spectroscopic ellipsometers, Surface free energy, Thermionic vacuum arc, Thin-film depositions, Optical films, glass, analytical equipment, Article, atomic force microscope, electric potential, electrode, energy, film, grain, hydrophobicity, morphology, optical tensiometer, optics, priority journal, reflectometer, refraction index, scanning electron microscope, spectrophotometer, spectroscopic ellipsometer, thermionic vacuum arc technique, vacuum, InGaN thin films, optical properties, surface free energy, surface properties, thermionic vacuum arc, Amorphous films, Atomic force microscopy, Deposition, Deposition rates, Electrodes, Free energy, Optical properties, Refractive index, Scanning electron microscopy, Substrates, Surface properties, Thin films, Vacuum applications, Vacuum technology, Wetting, Empirical relations, Field emission scanning electron microscopes, Morphological properties, Root mean square roughness, Spectroscopic ellipsometers, Surface free energy, Thermionic vacuum arc, Thin-film depositions, Optical films, glass, analytical equipment, Article, atomic force microscope, electric potential, electrode, energy, film, grain, hydrophobicity, morphology, optical tensiometer, optics, priority journal, reflectometer, refraction index, scanning electron microscope, spectrophotometer, spectroscopic ellipsometer, thermionic vacuum arc technique, vacuum
Kaynak
Scanning
WoS Q Değeri
Q3
Scopus Q Değeri
Q3
Cilt
38
Sayı
1
