The influence of voltage applied between the electrodes on optical and morphological properties of the InGaN thin films grown by thermionic vacuum arc

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dc.authorid55897767500
dc.authorid55897416100
dc.authorid9274843500
dc.authorid7003415405
dc.contributor.authorÖzen S.
dc.contributor.authorŞenay V.
dc.contributor.authorPat S.
dc.contributor.authorKorkmaz Ş.
dc.date.accessioned20.04.201910:49:12
dc.date.accessioned2019-04-20T21:43:43Z
dc.date.available20.04.201910:49:12
dc.date.available2019-04-20T21:43:43Z
dc.date.issued2016
dc.departmentBayburt Üniversitesien_US
dc.description.abstractThe aim of this research is to investigate the optical and morphological properties of the InGaN thin films deposited onto amorphous glass substrates in two separate experiments with two different voltages applied between the electrodes, i.e. 500 and 600 V by means of the thermionic vacuum arc technique. This technique is original for thin film deposition and it enables thin film production in a very short period of time. The optical and morphological properties of the films were investigated by using field emission scanning electron microscope, atomic force microscope, spectroscopic ellipsometer, reflectometer, spectrophotometer, and optical tensiometer. Optical properties were also supported by empirical relations. The deposition rates were calculated as 3 and 3.3 nm/sec for 500 and 600 V, respectively. The increase in the voltage also increased the refractive index, grain size, root mean square roughness and surface free energy. According to the results of the wetting experiments, InGaN samples were low-wettable, also known as hydrophobic. SCANNING 38:14-20, 2016. © 2015 Wiley Periodicals, Inc.en_US
dc.identifier.doi10.1002/sca.21237
dc.identifier.endpage20
dc.identifier.issn0161-0457
dc.identifier.issue1
dc.identifier.pmid26381668en_US
dc.identifier.scopus2-s2.0-84942052792en_US
dc.identifier.scopusqualityQ3en_US
dc.identifier.startpage14
dc.identifier.urihttps://dx.doi.org/10.1002/sca.21237
dc.identifier.urihttps://hdl.handle.net/20.500.12403/658
dc.identifier.volume38
dc.identifier.wosWOS:000373154600002en_US
dc.identifier.wosqualityQ3en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.indekslendigikaynakPubMeden_US
dc.language.isoenen_US
dc.publisherJohn Wiley and Sons Inc.
dc.relation.ispartofScanningen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/openAccessen_US
dc.subjectInGaN thin films
dc.subjectoptical properties
dc.subjectsurface free energy
dc.subjectsurface properties
dc.subjectthermionic vacuum arc
dc.subjectAmorphous films
dc.subjectAtomic force microscopy
dc.subjectDeposition
dc.subjectDeposition rates
dc.subjectElectrodes
dc.subjectFree energy
dc.subjectOptical properties
dc.subjectRefractive index
dc.subjectScanning electron microscopy
dc.subjectSubstrates
dc.subjectSurface properties
dc.subjectThin films
dc.subjectVacuum applications
dc.subjectVacuum technology
dc.subjectWetting
dc.subjectEmpirical relations
dc.subjectField emission scanning electron microscopes
dc.subjectMorphological properties
dc.subjectRoot mean square roughness
dc.subjectSpectroscopic ellipsometers
dc.subjectSurface free energy
dc.subjectThermionic vacuum arc
dc.subjectThin-film depositions
dc.subjectOptical films
dc.subjectglass
dc.subjectanalytical equipment
dc.subjectArticle
dc.subjectatomic force microscope
dc.subjectelectric potential
dc.subjectelectrode
dc.subjectenergy
dc.subjectfilm
dc.subjectgrain
dc.subjecthydrophobicity
dc.subjectmorphology
dc.subjectoptical tensiometer
dc.subjectoptics
dc.subjectpriority journal
dc.subjectreflectometer
dc.subjectrefraction index
dc.subjectscanning electron microscope
dc.subjectspectrophotometer
dc.subjectspectroscopic ellipsometer
dc.subjectthermionic vacuum arc technique
dc.subjectvacuum
dc.subjectInGaN thin films
dc.subjectoptical properties
dc.subjectsurface free energy
dc.subjectsurface properties
dc.subjectthermionic vacuum arc
dc.subjectAmorphous films
dc.subjectAtomic force microscopy
dc.subjectDeposition
dc.subjectDeposition rates
dc.subjectElectrodes
dc.subjectFree energy
dc.subjectOptical properties
dc.subjectRefractive index
dc.subjectScanning electron microscopy
dc.subjectSubstrates
dc.subjectSurface properties
dc.subjectThin films
dc.subjectVacuum applications
dc.subjectVacuum technology
dc.subjectWetting
dc.subjectEmpirical relations
dc.subjectField emission scanning electron microscopes
dc.subjectMorphological properties
dc.subjectRoot mean square roughness
dc.subjectSpectroscopic ellipsometers
dc.subjectSurface free energy
dc.subjectThermionic vacuum arc
dc.subjectThin-film depositions
dc.subjectOptical films
dc.subjectglass
dc.subjectanalytical equipment
dc.subjectArticle
dc.subjectatomic force microscope
dc.subjectelectric potential
dc.subjectelectrode
dc.subjectenergy
dc.subjectfilm
dc.subjectgrain
dc.subjecthydrophobicity
dc.subjectmorphology
dc.subjectoptical tensiometer
dc.subjectoptics
dc.subjectpriority journal
dc.subjectreflectometer
dc.subjectrefraction index
dc.subjectscanning electron microscope
dc.subjectspectrophotometer
dc.subjectspectroscopic ellipsometer
dc.subjectthermionic vacuum arc technique
dc.subjectvacuum
dc.titleThe influence of voltage applied between the electrodes on optical and morphological properties of the InGaN thin films grown by thermionic vacuum arcen_US
dc.typeArticleen_US

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