A study on optical, morphological and mechanical properties of Al2O3 ultra-thin films deposited by RF reactive magnetron sputtering

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dc.authorid9274843500
dc.authorid55897767500
dc.authorid55897416100
dc.authorid56399348800
dc.authorid54909207600
dc.authorid7003415405
dc.authorid9274843600
dc.authorid56399349300
dc.contributor.authorPat S.
dc.contributor.authorÖzen S.
dc.contributor.authorŞenay V.
dc.contributor.authorAydo?muş T.
dc.contributor.authorElmas S.
dc.contributor.authorKorkmaz Ş.
dc.contributor.authorEkem N.
dc.contributor.authorBalba? M.Z.
dc.date.accessioned20.04.201910:49:12
dc.date.accessioned2019-04-20T21:44:02Z
dc.date.available20.04.201910:49:12
dc.date.available2019-04-20T21:44:02Z
dc.date.issued2015
dc.departmentBayburt Üniversitesien_US
dc.description.abstractThe Al2O3 ultra-thin films with the thicknesses of 30 nm and 35 nm were deposited on glass microscope slides by a radio frequency reactive magnetron sputtering system. The optical, morphological and mechanical properties were investigated as function of the film thickness. The refractive index of the resulting Al2O3 ultra-thin film increased with the increasing thickness. Both the films showed high transparency of > 85% and low reflectivity of < 10% in the visible and near infrared region. A band gap of ?8.65 eV was obtained for the 30 nm film and ?7.53 eV for the 35 nm film from an empirical relation between refractive index and band gap. According to the results obtained from the AFM studies, the root mean square surface roughness of the films are 3.67 nm and 3.77 nm for the 30 nm and 35 nm film, respectively. The hardness and Young modulus values decreased with the increasing film thickness. Copyright © 2015 Inderscience Enterprises Ltd.en_US
dc.identifier.doi10.1504/IJSURFSE.2015.072061
dc.identifier.endpage424
dc.identifier.issn1749-785X
dc.identifier.issue5
dc.identifier.scopus2-s2.0-84943428603en_US
dc.identifier.scopusqualityQ3en_US
dc.identifier.startpage415
dc.identifier.urihttps://dx.doi.org/10.1504/IJSURFSE.2015.072061
dc.identifier.urihttps://hdl.handle.net/20.500.12403/751
dc.identifier.volume9
dc.identifier.wosWOS:000364815300004en_US
dc.identifier.wosqualityQ4en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherInderscience Enterprises Ltd.
dc.relation.ispartofInternational Journal of Surface Science and Engineeringen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectAFM
dc.subjectAl2O3 ultra-thin films
dc.subjectOptical properties
dc.subjectRF magnetron sputtering
dc.subjectAluminum
dc.subjectEnergy gap
dc.subjectFilm thickness
dc.subjectInfrared devices
dc.subjectMagnetron sputtering
dc.subjectMechanical properties
dc.subjectOptical properties
dc.subjectRefractive index
dc.subjectSputtering
dc.subjectSurface roughness
dc.subjectThin films
dc.subjectUltrathin films
dc.subjectAFM
dc.subjectEmpirical relations
dc.subjectGlass microscope slides
dc.subjectRadio frequency reactive magnetron sputtering
dc.subjectRefractive index and band gap
dc.subjectRF reactive magnetron sputtering
dc.subjectrf-Magnetron sputtering
dc.subjectVisible and near infrared
dc.subjectOptical films
dc.subjectAFM
dc.subjectAl2O3 ultra-thin films
dc.subjectOptical properties
dc.subjectRF magnetron sputtering
dc.subjectAluminum
dc.subjectEnergy gap
dc.subjectFilm thickness
dc.subjectInfrared devices
dc.subjectMagnetron sputtering
dc.subjectMechanical properties
dc.subjectOptical properties
dc.subjectRefractive index
dc.subjectSputtering
dc.subjectSurface roughness
dc.subjectThin films
dc.subjectUltrathin films
dc.subjectAFM
dc.subjectEmpirical relations
dc.subjectGlass microscope slides
dc.subjectRadio frequency reactive magnetron sputtering
dc.subjectRefractive index and band gap
dc.subjectRF reactive magnetron sputtering
dc.subjectrf-Magnetron sputtering
dc.subjectVisible and near infrared
dc.subjectOptical films
dc.titleA study on optical, morphological and mechanical properties of Al2O3 ultra-thin films deposited by RF reactive magnetron sputteringen_US
dc.typeArticleen_US

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