Influence of oxygen partial pressure on the metastable copper oxide thin films
Küçük Resim Yok
Tarih
2016
Yazarlar
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
World Scientific Publishing Co. Pte Ltd
Erişim Hakkı
info:eu-repo/semantics/closedAccess
Özet
Paramelaconite (Cu4O3) is a metastable copper oxide. Metastable copper oxide thin films were deposited on glass substrates by reactive RF magnetron sputtering in argon (Ar) and oxygen (O2) gas mixture atmospheres. Ar/O2 gas ratios in the sputtering ambient were chosen as 1/1 and 1/9. The surface and optical properties were determined by X-ray diffractometer (XRD), atomic force microscope (AFM) and UV-Vis spectrophotometer. The XRD patterns of the samples exhibited single strong diffraction peaks at 35.39° and 35.49° , corresponding to the (202) peak of Cu4O3. The mean thickness values were measured as 100 nm and 80 nm for the films deposited at 1/1 and 1/9 Ar/O2 gas ratios, respectively. The samples showed low transmittance and high absorbance in the high frequency region. © 2016 World Scientific Publishing Company.
Açıklama
Anahtar Kelimeler
AFM, Metastable copper oxide thin film, reactive RF sputter, XRD, AFM, Metastable copper oxide thin film, reactive RF sputter, XRD
Kaynak
Modern Physics Letters B
WoS Q Değeri
Q4
Scopus Q Değeri
Q3
Cilt
30
Sayı
35
