Influence of oxygen partial pressure on the metastable copper oxide thin films

Küçük Resim Yok

Tarih

2016

Dergi Başlığı

Dergi ISSN

Cilt Başlığı

Yayıncı

World Scientific Publishing Co. Pte Ltd

Erişim Hakkı

info:eu-repo/semantics/closedAccess

Özet

Paramelaconite (Cu4O3) is a metastable copper oxide. Metastable copper oxide thin films were deposited on glass substrates by reactive RF magnetron sputtering in argon (Ar) and oxygen (O2) gas mixture atmospheres. Ar/O2 gas ratios in the sputtering ambient were chosen as 1/1 and 1/9. The surface and optical properties were determined by X-ray diffractometer (XRD), atomic force microscope (AFM) and UV-Vis spectrophotometer. The XRD patterns of the samples exhibited single strong diffraction peaks at 35.39° and 35.49° , corresponding to the (202) peak of Cu4O3. The mean thickness values were measured as 100 nm and 80 nm for the films deposited at 1/1 and 1/9 Ar/O2 gas ratios, respectively. The samples showed low transmittance and high absorbance in the high frequency region. © 2016 World Scientific Publishing Company.

Açıklama

Anahtar Kelimeler

AFM, Metastable copper oxide thin film, reactive RF sputter, XRD, AFM, Metastable copper oxide thin film, reactive RF sputter, XRD

Kaynak

Modern Physics Letters B

WoS Q Değeri

Q4

Scopus Q Değeri

Q3

Cilt

30

Sayı

35

Künye