GaN thin film deposition on glass and PET substrates by thermionic vacuum arc (TVA)
Küçük Resim Yok
Tarih
2015
Yazarlar
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
Elsevier Ltd
Erişim Hakkı
info:eu-repo/semantics/closedAccess
Özet
In this paper, GaN thin film production was realized by thermionic vacuum arc (TVA), a plasma deposition technique, for the first time. We present a new deposition mechanism for GaN thin films with a very short production time. Microstructure properties of samples were analyzed by X-ray diffractometry. The peak at 2? = 72.88° corresponding to GaN (0004) was detected in XRD spectra. The surface morphology of the deposited GaN films was analyzed using field emission scanning electron microscopy and atomic force microscopy. The surface properties of the produced samples are quite different. The average roughness values were determined to be 0.48 nm for GaN/PET and 1.17 nm for GaN/glass. The optical properties (i.e., refractive index and reflection) were determined using an interferometer. Moreover, the obtained optical data were compared with bulk GaN materials. The refractive indexes were measured as 2.2, 3,0 and 2,5 for the GaN/glass, GaN/PET and bulk GaN, respectively. The transparencies of the different GaN-coated substrates are nearly the same. The obtained band gap values were measured in the energy range of 3.3-3.5 eV. TVA is a novel non-reactive plasma technique for the generation of metal organic thin films. The main advantage of this method is its fast deposition rate without any loss in the quality of the films. © 2015 Elsevier B.V.
Açıklama
Anahtar Kelimeler
Atomic force microscopy (AFM), Energy dispersive analysis of X-rays (EDS or EDAX), Optical properties, Surface properties, Thin films, Vacuum deposition, Atomic force microscopy, Energy gap, Field emission microscopes, Gallium nitride, Optical properties, Organometallics, Refractive index, Scanning electron microscopy, Surface properties, Thin films, Vacuum applications, Vacuum deposition, Vacuum technology, X ray diffraction analysis, Coated substrates, Deposition mechanism, Deposition technique, Energy dispersive analysis of X-rays, Field emission scanning electron microscopy, Metal organic thin films, Microstructure properties, Thermionic vacuum arc, Deposition, Atomic force microscopy (AFM), Energy dispersive analysis of X-rays (EDS or EDAX), Optical properties, Surface properties, Thin films, Vacuum deposition, Atomic force microscopy, Energy gap, Field emission microscopes, Gallium nitride, Optical properties, Organometallics, Refractive index, Scanning electron microscopy, Surface properties, Thin films, Vacuum applications, Vacuum deposition, Vacuum technology, X ray diffraction analysis, Coated substrates, Deposition mechanism, Deposition technique, Energy dispersive analysis of X-rays, Field emission scanning electron microscopy, Metal organic thin films, Microstructure properties, Thermionic vacuum arc, Deposition
Kaynak
Materials Chemistry and Physics
WoS Q Değeri
Q2
Scopus Q Değeri
Q1
Cilt
159
