GaN thin film deposition on glass and PET substrates by thermionic vacuum arc (TVA)

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dc.authorid9274843500
dc.authorid7003415405
dc.authorid55897767500
dc.authorid55897416100
dc.contributor.authorPat S.
dc.contributor.authorKorkmaz Ş.
dc.contributor.authorÖzen S.
dc.contributor.authorŞenay V.
dc.date.accessioned20.04.201910:49:12
dc.date.accessioned2019-04-20T21:44:02Z
dc.date.available20.04.201910:49:12
dc.date.available2019-04-20T21:44:02Z
dc.date.issued2015
dc.departmentBayburt Üniversitesien_US
dc.description.abstractIn this paper, GaN thin film production was realized by thermionic vacuum arc (TVA), a plasma deposition technique, for the first time. We present a new deposition mechanism for GaN thin films with a very short production time. Microstructure properties of samples were analyzed by X-ray diffractometry. The peak at 2? = 72.88° corresponding to GaN (0004) was detected in XRD spectra. The surface morphology of the deposited GaN films was analyzed using field emission scanning electron microscopy and atomic force microscopy. The surface properties of the produced samples are quite different. The average roughness values were determined to be 0.48 nm for GaN/PET and 1.17 nm for GaN/glass. The optical properties (i.e., refractive index and reflection) were determined using an interferometer. Moreover, the obtained optical data were compared with bulk GaN materials. The refractive indexes were measured as 2.2, 3,0 and 2,5 for the GaN/glass, GaN/PET and bulk GaN, respectively. The transparencies of the different GaN-coated substrates are nearly the same. The obtained band gap values were measured in the energy range of 3.3-3.5 eV. TVA is a novel non-reactive plasma technique for the generation of metal organic thin films. The main advantage of this method is its fast deposition rate without any loss in the quality of the films. © 2015 Elsevier B.V.en_US
dc.identifier.doi10.1016/j.matchemphys.2015.03.043
dc.identifier.endpage5
dc.identifier.issn0254-0584
dc.identifier.scopus2-s2.0-84929292559en_US
dc.identifier.scopusqualityQ1en_US
dc.identifier.startpage1
dc.identifier.urihttps://dx.doi.org/10.1016/j.matchemphys.2015.03.043
dc.identifier.urihttps://hdl.handle.net/20.500.12403/750
dc.identifier.volume159
dc.identifier.wosWOS:000355888200001en_US
dc.identifier.wosqualityQ2en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherElsevier Ltd
dc.relation.ispartofMaterials Chemistry and Physicsen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectAtomic force microscopy (AFM)
dc.subjectEnergy dispersive analysis of X-rays (EDS or EDAX)
dc.subjectOptical properties
dc.subjectSurface properties
dc.subjectThin films
dc.subjectVacuum deposition
dc.subjectAtomic force microscopy
dc.subjectEnergy gap
dc.subjectField emission microscopes
dc.subjectGallium nitride
dc.subjectOptical properties
dc.subjectOrganometallics
dc.subjectRefractive index
dc.subjectScanning electron microscopy
dc.subjectSurface properties
dc.subjectThin films
dc.subjectVacuum applications
dc.subjectVacuum deposition
dc.subjectVacuum technology
dc.subjectX ray diffraction analysis
dc.subjectCoated substrates
dc.subjectDeposition mechanism
dc.subjectDeposition technique
dc.subjectEnergy dispersive analysis of X-rays
dc.subjectField emission scanning electron microscopy
dc.subjectMetal organic thin films
dc.subjectMicrostructure properties
dc.subjectThermionic vacuum arc
dc.subjectDeposition
dc.subjectAtomic force microscopy (AFM)
dc.subjectEnergy dispersive analysis of X-rays (EDS or EDAX)
dc.subjectOptical properties
dc.subjectSurface properties
dc.subjectThin films
dc.subjectVacuum deposition
dc.subjectAtomic force microscopy
dc.subjectEnergy gap
dc.subjectField emission microscopes
dc.subjectGallium nitride
dc.subjectOptical properties
dc.subjectOrganometallics
dc.subjectRefractive index
dc.subjectScanning electron microscopy
dc.subjectSurface properties
dc.subjectThin films
dc.subjectVacuum applications
dc.subjectVacuum deposition
dc.subjectVacuum technology
dc.subjectX ray diffraction analysis
dc.subjectCoated substrates
dc.subjectDeposition mechanism
dc.subjectDeposition technique
dc.subjectEnergy dispersive analysis of X-rays
dc.subjectField emission scanning electron microscopy
dc.subjectMetal organic thin films
dc.subjectMicrostructure properties
dc.subjectThermionic vacuum arc
dc.subjectDeposition
dc.titleGaN thin film deposition on glass and PET substrates by thermionic vacuum arc (TVA)en_US
dc.typeArticleen_US

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