Some physical properties of the SiGe thin film coatings by thermionic vacuum arc (TVA)

Basit Öğe Kaydı
dc.authorid55897767500
dc.authorid9274843500
dc.authorid55897416100
dc.authorid7003415405
dc.authorid56659484600
dc.contributor.authorÖzen S.
dc.contributor.authorPat S.
dc.contributor.authorŞenay V.
dc.contributor.authorKorkmaz Ş.
dc.contributor.authorGeçici B.
dc.date.accessioned20.04.201910:49:12
dc.date.accessioned2019-04-20T21:44:04Z
dc.date.available20.04.201910:49:12
dc.date.available2019-04-20T21:44:04Z
dc.date.issued2015
dc.departmentBayburt Üniversitesien_US
dc.description.abstractSiGe thin films were deposited on glass and PET substrate by the thermionic vacuum arc (TVA) method for the first time. TVA is an anodic plasma generator which works in high vacuum conditions. Highly pure and quality films can be deposited on different substrates by means of this method. In order to characterize the produced films, X-ray diffraction, field emission scanning electron microscope (FESEM), atomic force microscope (AFM), energy dispersive X-ray spectrometer (EDX), optical tensiometer, UV-Vis spectrophotometer and spectroscopic ellipsometer (SE) devices were used. The obtained XRD peaks at 47° and 75° are described to the reflections of (220) and (331) planes of Ge or Si. According to the measurement results, substrates materials are affect the surface and optical properties of the deposited SiGe layers. SiGe coated samples with low optical band gaps exhibit low transparency and high absorption. The structures are homogenous and less rough. Copyright © 2015 American Scientific Publishers All rights reserved.en_US
dc.identifier.doi10.1166/jno.2015.1693
dc.identifier.endpage60
dc.identifier.issn1555-130X
dc.identifier.issue1
dc.identifier.scopus2-s2.0-84930034269en_US
dc.identifier.scopusqualityN/Aen_US
dc.identifier.startpage56
dc.identifier.urihttps://dx.doi.org/10.1166/jno.2015.1693
dc.identifier.urihttps://hdl.handle.net/20.500.12403/757
dc.identifier.volume10
dc.identifier.wosWOS:000357066200010en_US
dc.identifier.wosqualityQ3en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherAmerican Scientific Publishers
dc.relation.ispartofJournal of Nanoelectronics and Optoelectronicsen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectAFM
dc.subjectFESEM
dc.subjectOptical properties
dc.subjectSiGe thin films
dc.subjectTVA
dc.subjectXRD
dc.subjectAtomic force microscopy
dc.subjectEnergy gap
dc.subjectGermanium
dc.subjectScanning electron microscopy
dc.subjectSilicon alloys
dc.subjectSpectrometers
dc.subjectSubstrates
dc.subjectThin films
dc.subjectVacuum applications
dc.subjectVacuum technology
dc.subjectX ray diffraction
dc.subjectX ray spectrometers
dc.subjectAFM
dc.subjectFESEM
dc.subjectSiGe thin film
dc.subjectTVA
dc.subjectXRD
dc.subjectOptical properties
dc.subjectAFM
dc.subjectFESEM
dc.subjectOptical properties
dc.subjectSiGe thin films
dc.subjectTVA
dc.subjectXRD
dc.subjectAtomic force microscopy
dc.subjectEnergy gap
dc.subjectGermanium
dc.subjectScanning electron microscopy
dc.subjectSilicon alloys
dc.subjectSpectrometers
dc.subjectSubstrates
dc.subjectThin films
dc.subjectVacuum applications
dc.subjectVacuum technology
dc.subjectX ray diffraction
dc.subjectX ray spectrometers
dc.subjectAFM
dc.subjectFESEM
dc.subjectSiGe thin film
dc.subjectTVA
dc.subjectXRD
dc.subjectOptical properties
dc.titleSome physical properties of the SiGe thin film coatings by thermionic vacuum arc (TVA)en_US
dc.typeArticleen_US

Dosyalar

Koleksiyon

Scopus İndeksli Yayınlar Koleksiyonu
WoS İndeksli Yayınlar Koleksiyonu